Category: Etching and Deposition
Etching and deposition are processes that remove or add, through chemical reaction or by physical means, layers of film from or onto the material surface. The following papers discuss work that utilize Harrick Plasma equipment for such processes.
Articles- Cho, Young-Sang, Gi-Ra Yi, Jun Hyuk Moon, Dae-Chul Kim, Bong-Ju Lee, Seung-Man Yang. "Connected Open Structures from Close-Packed Colloidal Crystals by Hyperathermal Neutral Beam Etching." Langmuir (2005) 21: 10770-10775.
- Gourianova, Svetlana, Jürgen Fuhrmann. "Depth Profiling of Ultrathin P(S-b-MMA) Diblock Copolymer Films by Selective Solvent Crazing." Macromolecules (2004) 37: 1825-1830.
- Konrad, Matthias, Armin Knoll, Georg Krausch, Robert Magerle. "Volume Imaging of an Ultrathin SBS Triblock Copolymer Film." Macromolecules (2000) 33: 5518-5523.
- Kummer, Matthias, Jon R. Kirchhoff. "Electron-Transfer Properties of Pyrolytic Graphite Optically Transparent Electrodes." Electroanalysis (1996) 8(6): 524-528.